Chemical analysis testing is a technology that analyzes the composition, structure, content and other properties of substances by means of chemical principles, methodologies and instruments to provide data support. Its core objectives are divided into qualitative and quantitative analysis: qualitative analysis identifies components, such as heavy metal detection in water samples; quantitative analysis measures substance concentrations, for instance testing the vitamin C content in food.

It is mainly categorized into classical chemical analysis and modern instrumental analysis. The former relies on chemical properties and adopts gravimetry, titration and other methods, featuring low cost and suitability for macro analysis yet low testing efficiency. The latter leverages physical or physicochemical properties with instruments such as chromatographs and spectrometers, delivering high sensitivity and efficiency for microanalysis, albeit with expensive equipment investment.

The standard workflow consists of sample collection and preparation (ensuring sample representativeness and pretreatment), method selection and validation (selecting appropriate testing methods and verifying accuracy), instrument operation and data acquisition (standardized operation and data recording), as well as data processing and result reporting (data conversion and marking of critical information).

It boasts extensive application scenarios: the food industry conducts detection of residues and additives; the environmental sector analyzes water, air and soil samples; the pharmaceutical industry tests pharmaceutical ingredients and impurities. It is also applied in materials science, industrial manufacturing, public safety and other fields, serving as a vital technical pillar for modern society.

With the growing demand for monitoring fundamental material properties in semiconductor chemistry and electronic wet chemistry, the HuaWayDa Chemical Analysis Laboratory has established core testing capabilities covering trace metal testing, trace ion concentration measurement and comprehensive general chemical lab testing via a full suite of advanced analytical instruments, earning high recognition from customers through precise and reliable testing services.

For trace metal detection of semiconductor production chemicals, the laboratory provides ppt-level (10⁻¹² order of magnitude) trace metal analysis for ultra-pure water (UPW) and key chemicals including HF, HCl, HNO₃, H₂SO₄, H₃PO₄, NH₄OH, BOE, SC1, SC2, DEV, H₂O₂, IPA and NMP. For wafer surface metal contamination inspection, the detection sensitivity reaches 5E8 atoms/cm². A comprehensive range of metallic elements can be quantified, including Li, Na, Mg, Al, K, Cr, Mn, Fe, Ni, Pb, Co, Ca, Ga, As, Cu, Zn, Ag, Ba, Tl, B, Bi, Cd, In, Sr, W, Si, Ti and more, fully meeting the metal impurity control requirements throughout the entire semiconductor manufacturing process.

Furthermore, the laboratory also delivers specialized technical services such as isotope separation, offering all-round technical support for high-end material R&D and quality control in the semiconductor industry.