Chemical analysis and testing is a technology that utilizes chemical principles, methodologies and instruments to analyze the composition, structure and content of substances and provide data support. Its core objectives fall into qualitative and quantitative analysis. Qualitative analysis identifies components, such as heavy metal detection in water samples; quantitative analysis measures substance concentrations, for instance determining Vitamin C concentration in food.

It is mainly divided into classical chemical analysis and modern instrumental analysis. The former relies on chemical properties and adopts gravimetry, titration and other methods featuring low costs and suitability for macro analysis yet low efficiency. The latter makes use of physical or physicochemical properties together with instruments including chromatography and spectrometry, delivering high sensitivity and efficiency for trace analysis, though equipment investment is relatively high.

A typical workflow consists of sample collection and preparation (ensuring representativeness and sample pretreatment), method selection and validation (selecting appropriate approaches and verifying accuracy), instrument operation and data acquisition (standardized operation and data recording), data processing and result reporting (data conversion and marking of critical information).

It enjoys extensive applications: detection of residues and additives in the food industry; analysis of water, air and soil in environmental sectors; testing of pharmaceutical ingredients and impurities in medicine. It is also applied in materials science, industrial production, public security and other fields, acting as a vital technical support for modern society.

Against the growing demand for monitoring fundamental material properties in semiconductor chemistry and electronic wet chemistry, the HuaWayDa Chemical Analysis Laboratory is equipped with multiple advanced testing instruments to establish core capabilities covering trace metal testing, trace ion concentration measurement and comprehensive chemical laboratory testing. It has won high recognition from customers with accurate and reliable services.

For trace metal analysis of semiconductor process chemicals, the laboratory can perform ppt-level (10⁻¹² order of magnitude) trace metal analysis for ultra-pure water (UPW) and key chemicals including HF, HCl, HNO₃, H₂SO₄, H₃PO₄, NH₄OH, BOE, SC1, SC2, DEV, H₂O₂, IPA and NMP. For surface metal contamination detection on wafers, the sensitivity reaches 5E8 atoms/cm². A comprehensive spectrum of metals can be analyzed, including Li, Na, Mg, Al, K, Cr, Mn, Fe, Ni, Pb, Co, Ca, Ga, As, Cu, Zn, Ag, Ba, Tl, B, Bi, Cd, In, Sr, W, Si, Ti and other elements, satisfying the requirements for metal impurity control throughout the entire semiconductor manufacturing process.

Furthermore, the laboratory provides distinctive technical services such as isotope separation, delivering all-round technical support for high-end material R&D and quality control within the semiconductor industry.